Computer Simulation of Temperature Parameter for Diamond Formation by Using Hot-Filament Chemical Vapor Deposition
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چکیده
منابع مشابه
Computer Simulation of Temperature Parameter for Diamond Formation by Using Hot-Filament Chemical Vapor Deposition
To optimize the deposition parameters of diamond films, the temperature, pressure, and distance between the filament and the susceptor need to be considered. However, it is difficult to precisely measure and predict the filament and susceptor temperature in relation to the applied power in a hot filament chemical vapor deposition (HF-CVD) system. In this study, the temperature distribution insi...
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ژورنال
عنوان ژورنال: Coatings
سال: 2017
ISSN: 2079-6412
DOI: 10.3390/coatings8010015